PARAGRAF

 Cambridge

Paragraf has perfected a proprietary process for depositing single-atom thick, two-dimensional materials, including graphene, directly onto silicon, silicon-carbide, sapphire, gallium-nitride, and other semiconductor-compatible substrates. The contamination-free technology is scalable, and compatible with existing electronic device manufacturing processes.

Serving the sensor, energy harvesting and semiconductor markets, Paragraf has developed its own Hall-Effect Sensors for measuring magnetic fields in demanding environments. It is now partnering with electronic device makers to enable them to take advantage of the unique properties of graphene.